Registry
Module Specifications
Current Academic Year 2012 - 2013
Please note that this information is subject to change.
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| Description | |||||||||||||||||||||||||||||||||||||||||
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Examine the most important diagnostic sensors which are used in process development and plasma reactor monitoring. Introduce a wide range of techniques which can be used to characterise industrial plasmas. Provide the students with the requisite knowledge and ability to choose and operate commercial diagnostic equipment. Give the student a critical appreciation of where and when specific techniques are applicable. | |||||||||||||||||||||||||||||||||||||||||
| Learning Outcomes | |||||||||||||||||||||||||||||||||||||||||
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1. Identify the important plasma parameters and their expected values in plasma applications. 2. Identity the fundamental principles of electrical, optical and particle measurement techniques. 3. Critically evaluate plasma sensor specifications using manufacturer's technical literature and technical literature. 4. Recognise process control issues and strategies for plasma processing. 5. Communicate their ideas with their colleagues | |||||||||||||||||||||||||||||||||||||||||
All module information is indicative and subject to change. For further information,students are advised to refer to the University's Marks and Standards and Programme Specific Regulations at: http://www.dcu.ie/registry/examinations/index.shtml |
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| Indicative Content and Learning Activities | |||||||||||||||||||||||||||||||||||||||||
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Plasma Parameters. Density, temperature, and particle distribution functions. Wall fluxes of charged and neutral species, energy distribution functions. Plasma emission. Plasma operating regimes.Electrical Measurements: Langmuir probes, magnetic probes, emission probes and other specialised probe concepts. Measurement of circuit parameters including current, voltage and power. Harmonic analysis for rf plasmas. Circuit characterisation and modelling.Optical and Spectroscopic Techniques: Fundamentals of emission of radiation by plasmas. Emission spectroscopy and actinometry. Absorption spectroscopy. Line shapes and broadening. Doppler broadening, Stark shift and other examples. Active techniques including Thompson scattering and LIF.Particle Measurement: Energy analysers, ion mass spectrometry. Process gas analysis in plasmas.Process Sensors: Quartz crystal monitors, laser interferometry and reflectometry, in-situ ellipsometry.Process Control: Process control strategies. Statistical process analysis. End point detection.. | |||||||||||||||||||||||||||||||||||||||||
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| Indicative Reading List | |||||||||||||||||||||||||||||||||||||||||
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| Other Resources | |||||||||||||||||||||||||||||||||||||||||
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| Array | |||||||||||||||||||||||||||||||||||||||||
| Programme or List of Programmes | |||||||||||||||||||||||||||||||||||||||||
| MPV | MSc in Plasma and Vacuum Technology | ||||||||||||||||||||||||||||||||||||||||
| SMPP | Single Module Programme (Plasma) | ||||||||||||||||||||||||||||||||||||||||
| Timetable this semester: Timetable for PS514 | |||||||||||||||||||||||||||||||||||||||||
| Date of Last Revision | 12-SEP-08 | ||||||||||||||||||||||||||||||||||||||||
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