Registry
Module Specifications
Current Academic Year 2012 - 2013
Please note that this information is subject to change.
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| Description | |||||||||||||||||||||||||||||||||||||||||||||||||||||
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The purpose of this module is to provide participants with a broad introduction to the fundamentals concepts of plasma processing. In this module students will develop knowledge and skills relating to plasma composition and plasma surface interactions. The course aims to give students a full and thorough knowledge of these topics with emphasis placed on the relationship of the course material to various aspects of plasma processing of materials in industrial applications and related topics.Students are expected to access all course material online, participate in online discussion groups where they can discuss the course material and set problems relating to the course material, and participate in various learning activities and continuous assessment tasks on a regular basis. | |||||||||||||||||||||||||||||||||||||||||||||||||||||
| Learning Outcomes | |||||||||||||||||||||||||||||||||||||||||||||||||||||
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1. Relate the main collisional processes to plasma composition and chemistry. 2. Describe the various types of interaction between plasma species and surfaces. 3. Discuss plasma film growth and deposition techniques. 4. Contrast plasma etch mechanisms with traditional chemical etch methods. 5. Understand the operation of RF plasma devices in relation to surface processing. 6. Solve applied problems, identifying the key parameters involved and performing relevant numerical calcuations. 7. Relate the material covered to various plasma processes commonly used in industry. 8. Communicate the material covered and its applications to their collegues. | |||||||||||||||||||||||||||||||||||||||||||||||||||||
All module information is indicative and subject to change. For further information,students are advised to refer to the University's Marks and Standards and Programme Specific Regulations at: http://www.dcu.ie/registry/examinations/index.shtml |
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Indicative syllabus. Plasma Surface Interactions. Plasma Chemistry. Plasma Processing. Sputtering. Etching. Specific industrial plasma Processes. Chemical Etching vs Physical Etching. Overview of complex structures.. | |||||||||||||||||||||||||||||||||||||||||||||||||||||
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