Robert O'Connor
Dr
Dr. Robert O’Connor graduated with a BSc. in Applied Physics from Dublin City University in 2001 and a PhD in Semiconductor Physics from the same institution in 2005, which focused on the characterization of advanced materials for ultra-large scale complementary metal-oxide-semiconductor (CMOS) processes.
In 2006 he worked at Intel Ireland as a process engineer, during which time he was awarded a Marie Curie Intra European Fellowship to work at IMEC, Belgium on electrical characterization of high-k dielectric materials. Following this, in 2009 he secured an Irish Research Council EMBARK Fellowship to continue his research on the characterisation of dielectric materials for future CMOS technologies. The project, which received follow-up funding from the Science Foundation Ireland ‘FORME’ Strategic Research Cluster, focused on the characterisation of the interfacial region in MOSFET devices with high-k dielectrics and group III-V high mobility substrates in collaboration with Intel.
In 2012 he joined the academic staff at Dublin City University in the School of Physical Sciences and has been awarded several research grants including an SFI TIDA award that funded research on the development of novel materials for solar water splitting to yield hydrogen fuel. This grant has led to follow on funding from the Sustainable Energy Authority of Ireland and Enterprise Ireland and he is currently leading a 4-year project in this area.
He also collaborates with scientists at Trinity College Dublin on an SFI funded SPOKE project which is focused on the development of block-copolymers for area selective deposition, and with researchers at IMEC, Belgium on the characterisation of self-assembled monolayers also with a focus on their potential in the area selective deposition field.
In 2006 he worked at Intel Ireland as a process engineer, during which time he was awarded a Marie Curie Intra European Fellowship to work at IMEC, Belgium on electrical characterization of high-k dielectric materials. Following this, in 2009 he secured an Irish Research Council EMBARK Fellowship to continue his research on the characterisation of dielectric materials for future CMOS technologies. The project, which received follow-up funding from the Science Foundation Ireland ‘FORME’ Strategic Research Cluster, focused on the characterisation of the interfacial region in MOSFET devices with high-k dielectrics and group III-V high mobility substrates in collaboration with Intel.
In 2012 he joined the academic staff at Dublin City University in the School of Physical Sciences and has been awarded several research grants including an SFI TIDA award that funded research on the development of novel materials for solar water splitting to yield hydrogen fuel. This grant has led to follow on funding from the Sustainable Energy Authority of Ireland and Enterprise Ireland and he is currently leading a 4-year project in this area.
He also collaborates with scientists at Trinity College Dublin on an SFI funded SPOKE project which is focused on the development of block-copolymers for area selective deposition, and with researchers at IMEC, Belgium on the characterisation of self-assembled monolayers also with a focus on their potential in the area selective deposition field.
Peer Reviewed Journal
| Year | Publication | |
|---|---|---|
| 2025 | (2025) 'Synthesis of Carbon Dots from Spent Coffee Grounds: Transforming Waste into Potential Biomedical Tools'. Nanoscale, . [DOI] | |
| 2024 | Cannon, P.; McGlynn, E.; O'Neill, D.; Darcy, C.; Rouse, E.; O'Connor, R.; Freeland, B.; O'Connell, B.; Gaughran, J. (2024) 'Deposition of high-quality, nanoscale SiO2 films and 3D structures'. Applied Materials Today, 38 . [Link] [DOI] | |
| 2024 | Haris, M.; Midveris, K.; Shabbir, S.A.; Nawaz, S.; Tamulevičius, T.; Klyvis, G.; Mikalkevičius, M.; Monshi, M.; Lazauskas, A.; O'Connor, R.; Brandon, M.; Selskis, A.; Balčiūnaitė, A.; Tamulevičienė, A.; Tamulevičius, S. (2024) '2D-reduced graphene oxide induced bi-functional plasmonic CuBi2O4/RGO/BiVO4/Au heterostructure for visible light driven photoelectrochemical water splitting'. International Journal of Hydrogen Energy, 96 . [Link] [DOI] | |
| 2024 | Reid, G.; Podhorska, L.; Mc Fadden, J.; O'Connor, R.; Rodriguez, B.J.; Quinn, L.; Hiebner, D.; Casey, E.; Kelleher, S.M. (2024) 'Insights into the feature size required for the death of Pseudomonas fluorescens on nanostructured silicon fabricated by block copolymer lithography'. Materials Today Communications, . [Link] [DOI] | |
| 2024 | (2024) 'Parametric investigation of ultrashort pulsed laser surface texturing on aluminium alloy 7075 for hydrophobicity enhancement'. International Journal of Advanced Manufacturing Technology, . [DOI] | |
| 2023 | Yadav, P.; Singh, S.; Prochukhan, N.; Davó-Quiñonero, A.; Conway, J.; Gatensby, R.; Padmanabhan, S.C.; Snelgrove, M.; McFeely, C.; Shiel, K.; O'Connor, R.; McGlynn, E.; Turner, M.; Lundy, R.; Morris, M.A. (2023) 'Fabrication of sub-5 nm uniform zirconium oxide films on corrugated copper substrates by a scalable polymer brush assisted deposition method'. Applied Surface Science, 627 . [Link] [DOI] | |
| 2023 | S O’Donnell; D O’Neill; K Shiel; M Snelgrove; F Jose; C McFeely; R O’Connor (2023) 'Plasma-enhanced atomic layer deposition of nickel and nickel oxide on silicon for photoelectrochemical applications'. Journal of Physics D: Applied Physics, . [Link] [DOI] | |
| 2023 | (2023) 'A comprehensive characterization of the effect of spatter powder on IN939 parts fabricated by laser powder bed fusion'. Materials and Design, . https://doi.org/10.1016/j.matdes.2023.112406 | |
| 2023 | Doğu, M.N.; Mussatto, A.; Yalçın, M.A.; Ozer, S.; Davut, K.; Obeidi, M.A.; Kumar, A.; Hudson, S.; O'Neill, D.; O'Connor, R.; Gu, H.; Brabazon, D. (2023) 'A comprehensive characterization of the effect of spatter powder on IN939 parts fabricated by laser powder bed fusion'. Materials and Design, 235 . [Link] [DOI] | |
| 2022 | Brady-Boyd, A.; O'Connor, R.; Armini, S.; Selvaraju, V.; Pasquali, M.; Hughes, G.; Bogan, J. (2022) 'The role of atomic oxygen in the decomposition of self-assembled monolayers during area-selective atomic layer deposition'. Applied Surface Science, . [Link] [DOI] | |
| 2022 | S O’Donnell; M Snelgrove; K Shiel; C Weiland; G Hughes; J Woicik; D O’Neill; F Jose; C McFeely; R O’Connor (2022) 'Growth chemistry of cobalt nitride by plasma enhanced atomic layer deposition'. Materials Research Express, . [Link] [DOI] | |
| 2022 | Yadav, Pravind; Gatensby, Riley; Prochukhan, Nadezda; Padmanabhan, Sibu C.; Davo-Quinonero, Arantxa; Darragh, Philip; Senthamaraikannan, Ramsankar; Snelgrove, Matthew; McFeely, Caitlin; Singh, Sajan; Conway, Jim; O'Connor, Robert; McGlynn, Enda; Lundy, Ross; Morris, Michael A. (2022) 'Fabrication of High-κ Dielectric Metal Oxide Films on Topographically Patterned Substrates: Polymer Brush-Mediated Depositions'. ACS applied materials & interfaces, 14 (28). [DOI] | |
| 2022 | O'Donnell, S.; Jose, F.; Shiel, K.; Snelgrove, M.; McFeely, C.; McGill, E.; O'Connor, R. (2022) 'Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2on silicon from amide and alkoxide precursors: Growth chemistry and photoelectrochemical performance'. Journal of Physics D: Applied Physics, . [Link] [DOI] | |
| 2022 | J Conway; M Snelgrove; P Yadav; K Shiel; R Lundy; A Selkirk; R O’Connor; M A Morris; M M Turner; S Daniels (2022) 'Use of plasma oxidation for conversion of metal salt infiltrated thin polymer films to metal oxide'. Journal of Physics D: Applied Physics, . [Link] [DOI] | |
| 2022 | Snelgrove, M.; McFeely, C.; Hughes, G.; Weiland, C.; Woicik, J.C.; Shiel, K.; González, P.G.M.; Ornelas, C.; Solís-Canto, ; Cherkaoui, K.; Hurley, P.K.; Yadav, P.; Morris, M.A.; McGlynn, E.; O'Connor, R. (2022) 'Growth chemistry and electrical performance of ultrathin alumina formed by area selective vapor phase infiltration'. Microelectronic Engineering, 266 . [Link] [DOI] | |
| 2022 | (2022) 'Rapid area deactivation for blocking atomic layer deposition processes using polystyrene brush layers'. Journal of Materials Chemistry C, . [DOI] | |
| 2021 | (2021) 'Titanium infiltration into ultrathin PMMA brushes'. Journal of Vacuum Science and Technology A, . [Link] [DOI] | |
| 2021 | M. Snelgrove, C. McFeely, K. Shiel, G. Hughes, P. Yadav, C. Weiland, J. C. Woicik, P. G. Mani-Gonzalez, R. Lundy, M. A. Morris, E. McGlynn and R. O’Connor (2021) 'Analysing trimethylaluminum infiltration into polymer brushes using a scalable area selective vapor phase process'. Materials Advances, . | |
| 2021 | Snelgrove, M.; McFeely, C.; Shiel, K.; Hughes, G.; Yadav, P.; Weiland, C.; Woicik, J.C.; Mani-Gonzalez, P.G.; Lundy, R.; Morris, M.A.; McGlynn, E.; O'Connor, R. (2021) 'Analysing trimethylaluminum infiltration into polymer brushes using a scalable area selective vapor phase process'. Materials Advances, 2 . [Link] [DOI] | |
| 2020 | Mani-Gonzalez, P.G.; Snelgrove, M.; Rueff, J.-P.; Lundy, R.; Yadav, P.; Bogan, J.; O'Connor, R.; Morris, M.; Hughes, G. (2020) 'Analysis of Al and Cu salt infiltration into a poly 2-vinylpyridine (P2vP) polymer layer for area selective deposition applications'. Journal of Physics D: Applied Physics, . [Link] [DOI] | |
| 2020 | Zyulkov, I.; Madhiwala, V.; Voronina, E.; Snelgrove, M.; Bogan, J.; O'Connor, R.; De Gendt, S.; Armini, S. (2020) 'Area-Selective ALD of Ru on Nanometer-Scale Cu Lines through Dimerization of Amino-Functionalized Alkoxy Silane Passivation Films'. ACS APPLIED MATERIALS AND INTERFACES, . [Link] [DOI] | |
| 2020 | Gorji, N.E.; Saxena, P.; Corfield, M.; Clare, A.; Rueff, J.P.; Bogan, J.; González, P.G.M.; Snelgrove, M.; Hughes, G.; O'Connor, R.; Raghavendra, R.; Brabazon, D. (2020) 'A new method for assessing the recyclability of powders within Powder Bed Fusion process'. Materials Characterization, 161 . [Link] [DOI] | |
| 2020 | Snelgrove, M.; McFeely, C.; Mani-Gonzalez, P.G.; Lahtonen, K.; Lundy, R.; Hughes, G.; Valden, M.; McGlynn, E.; Yadav, P.; Saari, J.; Morris, M.A.; O'Connor, R. (2020) 'Aluminium oxide formation via atomic layer deposition using a polymer brush mediated selective infiltration approach'. Applied Surface Science, 515 . [Link] [DOI] | |
| 2020 | (2020) 'Precise Definition of a “Monolayer Point” in Polymer Brush Films for Fabricating Highly Coherent TiO2 Thin Films by Vapor-Phase Infiltration'. Langmuir, . [Link] [DOI] | |
| 2020 | Biswas, P.; Ainabayev, A.; Zhussupbekova, A.; Jose, F.; O’Connor, R.; Kaisha, A.; Walls, B.; Shvets, I.V. (2020) 'Tuning of oxygen vacancy-induced electrical conductivity in Ti-doped hematite films and its impact on photoelectrochemical water splitting'. Scientific Reports, 10 . [Link] [DOI] | |
| 2020 | Ahmed Obeidi, M.; Mussatto, A.; Groarke, R.; Vijayaraghavan, R.K.; Conway, A.; Rossi Kaschel, F.; McCarthy, E.; Clarkin, O.; O'Connor, R.; Brabazon, D. (2020) 'Comprehensive assessment of spatter material generated during selective laser melting of stainless steel'. Materials Today Communications, 25 . [Link] [DOI] | |
| 2020 | Gorji, N.E.; O'Connor, R.; Mussatto, A.; Snelgrove, M.; Mani González, P.G.; Brabazon, D. (2020) 'Corrigendum to ``Recyclability of stainless steel (316 L) powder within the additive manufacturing process'' [Materialia, 8 (2019) 100489] (Materialia (2019) 8, (S2589152919302856), (10.1016/j.mtla.2019.100489))'. Materialia, . [Link] [DOI] | |
| 2019 | Snelgrove, M.; Mani-Gonzalez, P.G.; Bogan, J.; Lundy, R.; Rueff, J.-P.; Hughes, G.; Yadav, P.; McGlynn, E.; Morris, M.; O'Connor, R. (2019) 'Hard x-ray photoelectron spectroscopy study of copper formation by metal salt inclusion in a polymer film'. Journal of Physics D: Applied Physics, . [Link] [DOI] | |
| 2019 | Gorji, N.E.; O'Connor, R.; Mussatto, A.; Snelgrove, M.; González, P.G.M.; Brabazon, D. (2019) 'Recyclability of stainless steel (316 L) powder within the additive manufacturing process'. Materialia, 8 . [Link] [DOI] | |
| 2019 | Snelgrove, M.; Zehe, C.; Lundy, R.; Yadav, P.; Rueff, J.-P.; O'Connor, R.; Bogan, J.; Hughes, G.; McGlynn, E.; Morris, M.; Mani-Gonzalez, P.G. (2019) 'Surface characterization of poly-2-vinylpyridine - A polymer for area selective deposition techniques'. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, . [Link] [DOI] | |
| 2018 | Brady-Boyd, A.; O'Connor, R.; Armini, S.; Selvaraju, V.; Hughes, G.; Bogan, J. (2018) 'On the use of (3-trimethoxysilylpropyl)diethylenetriamine self-assembled monolayers as seed layers for the growth of Mn based copper diffusion barrier layers'. Applied Surface Science, . [Link] [DOI] | |
| 2018 | Brady-Boyd, A and O’Connor, R and Armini, S and Selvaraju, V and Hughes, G and Bogan, J (2018) 'On the use of (3-trimethoxysilylpropyl) diethylenetriamine self-assembled monolayers as seed layers for the growth of Mn based copper diffusion barrier layers'. 427 :260-266. | |
| 2018 | Flynn, S.P.; Bogan, J.; Lundy, R.; Khalafalla, K.E.; Shaw, M.; Rodriguez, B.J.; Swift, P.; Daniels, S.; O'Connor, R.; Hughes, G.; Kelleher, S.M. (2018) 'Nitrogen reactive ion etch processes for the selective removal of poly-(4-vinylpyridine) in block copolymer films'. Nanotechnology, 29 . [Link] [DOI] | |
| 2018 | Selvaraju, V.; Brady-Boyd, A.; O'Connor, R.; Hughes, G.; Bogan, J. (2018) 'Investigation of nitrogen incorporation into manganese based copper diffusion barrier layers for future interconnect applications'. Surfaces And Interfaces, 13 . [Link] [DOI] | |
| 2018 | Bogan, J.; Brady-Boyd, A.; Armini, S.; Lundy, R.; Selvaraju, V.; O'Connor, R. (2018) 'Nucleation and adhesion of ultra-thin copper films on amino-terminated self-assembled monolayers'. Applied Surface Science, . [Link] [DOI] | |
| 2018 | Bogan, J.; Selvaraju, V.; Brady-Boyd, A.; Hughes, G.; O'Connor, R. (2018) 'Synchrotron radiation study of metallic titanium deposited on dielectric substrates'. Journal Of Vacuum Science And Technology B: Nanotechnology And Microelectronics, . [Link] [DOI] | |
| 2018 | (2018) 'Nitrogen reactive ion etch processes for the selective removal of poly-(4-vinylpyridine) in block copolymer films'. Nanotechnology, . [Link] [DOI] | |
| 2016 | O'Connor, Robert and Bogan, Justin and McCoy, Anthony and Byrne, Conor and Hughes, Greg (2016) 'A photoemission study of the effectiveness of nickel, manganese, and cobalt based corrosion barriers for silicon photo-anodes during water oxidation'. 119 (19). | |
| 2016 | Bogan, J and Lundy, Ross and P. McCoy, A and O'Connor, R and Byrne, C and Walsh, L and Casey, P and Hughes, G (2016) 'In-situ surface and interface study of atomic oxygen modified carbon containing porous low-$\kappa$ dielectric films for barrier layer applications'. 120 (10). | |
| 2016 | O'Connor, R.; Bogan, J.; McCoy, A.; Byrne, C.; Hughes, G. (2016) 'A photoemission study of the effectiveness of nickel, manganese, and cobalt based corrosion barriers for silicon photo-anodes during water oxidation'. Journal of Applied Physics, 119 . [Link] [DOI] | |
| 2016 | Bogan, J.; Lundy, R.; McCoy, A.; O'Connor, R.; Byrne, C.; Walsh, L.; Casey, P.; Hughes, G. (2016) 'In-situ surface and interface study of atomic oxygen modified carbon containing porous low-κ dielectric films for barrier layer applications'. Journal of Applied Physics, . [Link] [DOI] | |
| 2015 | O'Connor, R.; Bogan, J.; Fleck, N.; McCoy, A.; Walsh, L.A.; Byrne, C.; Casey, P.; Hughes, G. (2015) 'Growth and characterization of thin manganese oxide corrosion barrier layers for silicon photoanode protection during water oxidation'. Solar Energy Materials and Solar Cells, . [Link] [DOI] | |
| 2015 | McCoy, AP and Bogan, J and Walsh, L and Byrne, C and O’Connor, R and Woicik, JC and Hughes, G (2015) 'The impact of porosity on the formation of manganese based copper diffusion barrier layers on low-$\kappa$ dielectric materials'. 48 (32). | |
| 2015 | O’Connor, Robert and Bogan, Justin and Fleck, Nicole and McCoy, Anthony and Walsh, Lee A and Byrne, Conor and Casey, Patrick and Hughes, Greg (2015) 'Growth and characterization of thin manganese oxide corrosion barrier layers for silicon photoanode protection during water oxidation'. 136 :64-69. | |
| 2015 | McCoy, A.P.; Bogan, J.; Walsh, L.; Byrne, C.; O'Connor, R.; Woicik, J.C.; Hughes, G. (2015) 'The impact of porosity on the formation of manganese based copper diffusion barrier layers on low-κ dielectric materials'. Journal of Physics D: Applied Physics, . [Link] [DOI] | |
| 2014 | Bogan, J and McCoy, AP and O’Connor, R and Casey, P and Byrne, C and Hughes, G (2014) 'Photoemission study of the identification of Mn silicate barrier formation on carbon containing low-$\kappa$ dielectrics'. 130 :46-51. | |
| 2014 | Bogan, J.; McCoy, A.P.; O'Connor, R.; Casey, P.; Byrne, C.; Hughes, G. (2014) 'Photoemission study of the identification of Mn silicate barrier formation on carbon containing low-κ dielectrics'. Microelectronic Engineering, . [Link] [DOI] | |
| 2013 | O’Connor, Robert and Kauerauf, Thomas and Arimura, Hiroaki and Ragnarsson, Lars-Ake (2013) 'Stress induced defect generation implications of doping HfO2 with Al'. 109 :54-56. | |
| 2013 | Casey, Patrick and McCoy, Anthony P and Bogan, Justin and Byrne, Conor and Walsh, Lee and O’Connor, Robert and Hughes, Greg (2013) 'In Situ Investigations into the Mechanism of Oxygen Catalysis on Ruthenium/Manganese Surfaces and the Thermodynamic Stability of Ru/Mn-Based Copper Diffusion Barrier Layers'. 117 (31):16136-16143. | |
| 2013 | Casey, P.; McCoy, A.P.; Bogan, J.; Byrne, C.; Walsh, L.; O'Connor, R.; Hughes, G. (2013) 'In situ investigations into the mechanism of oxygen catalysis on ruthenium/manganese surfaces and the thermodynamic stability of Ru/Mn-based copper diffusion barrier layers'. Journal of Physical Chemistry C, . [Link] [DOI] | |
| 2013 | O'Connor, R.; Kauerauf, T.; Arimura, H.; Ragnarsson, L.A. (2013) 'Stress induced defect generation implications of doping HfO2 with Al'. Microelectronic Engineering, . [Link] [DOI] | |
| 2011 | O'Connor, Robert and Hughes, Greg and Kauerauf, Thomas (2011) 'Time-Dependent Dielectric Breakdown and Stress-Induced Leakage Current Characteristics of 0.7-nm-EOT $$\backslash$hbox $$HfO$\$ \_ $$2$\$ $ pFETs'. 11 (2):290-294. | |
| 2011 | O'Connor, R.; Hughes, G.; Kauerauf, T. (2011) 'Time-Dependent Dielectric Breakdown and Stress-Induced Leakage Current Characteristics of 0.7-nm-EOT HfO2 pFETs'. IEEE Transactions on Device and Materials Reliability, 11 . [Link] [DOI] | |
| 2011 | O’Connor, Robert and Hughes, Greg and Kauerauf, Thomas and Ragnarsson, Lars-Ake (2011) 'Reliability of thin ZrO2 gate dielectric layers'. 51 (6):1118-1122. | |
| 2011 | Oconnor, R.; Hughes, G. (2011) 'The effect of a post processing thermal anneal on pre-existing and stress induced electrically active defects in ultra-thin SiON dielectric layers'. Microelectronics Reliability, . [Link] [DOI] | |
| 2011 | O’Connor, Robert and Hughes, Greg (2011) 'The effect of a post processing thermal anneal on pre-existing and stress induced electrically active defects in ultra-thin SiON dielectric layers'. 51 (3):524-528. | |
| 2010 | O’Connor, Robert and Hughes, Greg and Casey, Patrick and Newcomb, Simon B (2010) 'Degradation and breakdown characteristics of thin MgO dielectric layers'. 107 (2). | |
| 2010 | O'Connor, R.; Hughes, G.; Casey, P.; Newcomb, S.B. (2010) 'Degradation and breakdown characteristics of thin MgO dielectric layers'. Journal of Applied Physics, . [Link] [DOI] | |
| 2009 | Pantisano, Luigi and Trojman, Lionel and Aoulaiche, Marc and O'Connor, R and Kaczer, Ben and Groeseneken, Guido (2009) 'Understanding and Importance of Defects in Advanced Materials'. 18 (1):651-658. | |
| 2009 | Aoulaiche, M.; Kaczer, B.; Roussel, Ph.J.; O'Connor, R.; Houssa, M.; De Gendt, S.; Maes, H.E.; Groeseneken, G. (2009) 'Impact of nitridation on recoverable and permanent negative bias temperature instability degradation in high-k /metal-gate p-type metal oxide semiconductor field effect transistors'. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, . [Link] [DOI] | |
| 2009 | Aoulaiche, Marc and Kaczer, Ben and Roussel, Ph J and O’Connor, Rob and Houssa, Michel and De Gendt, Stefan and Maes, HE and Groeseneken, Guido (2009) 'Impact of nitridation on recoverable and permanent negative bias temperature instability degradation in high-k/metal-gate p-type metal oxide semiconductor field effect transistors'. 27 (1):463-467. | |
| 2008 | O'Connor, R.; Pantisano, L.; Degraeve, R.; Kauerauf, T.; Kaczer, B.; Roussel, P.; Groeseneken, G. (2008) 'Electron energy dependence of defect generation in high- k gate stacks'. Journal of Applied Physics, . [Link] [DOI] | |
| 2008 | O’Connor, Robert and Chang, Vincent S and Pantisano, Luigi and Ragnarsson, Lars-\AAke and Aoulaiche, Marc and O’Sullivan, Barry and Groeseneken, Guido (2008) 'Anomalous positive-bias temperature instability of high-$\kappa$/metal gate devices with Dy 2 O 3 capping'. 93 (5). | |
| 2008 | Zahid, Mohammed B and Pantisano, Luigi and Degraeve, Robin and Aoulaiche, M and Trojman, L and Ferain, I and San Andres, E and Shickova, A and O'Connor, R and Groeseneken, Guido and others (2008) 'Trapping in 1nm EOT high-k/MG'. 16 (5):77-84. | |
| 2008 | O'Connor, R.; Chang, V.S.; Pantisano, L.; Ragnarsson, L.-A.; Aoulaiche, M.; O'Sullivan, B.; Groeseneken, G. (2008) 'Anomalous positive-bias temperature instability of high- κ /metal gate devices with Dy2 O3 capping'. Applied Physics Letters, . [Link] [DOI] | |
| 2008 | O’Connor, Robert and Pantisano, Luigi and Degraeve, Robin and Kauerauf, Thomas and Kaczer, Ben and Roussel, Phillipe and Groeseneken, Guido (2008) 'Electron energy dependence of defect generation in high-k gate stacks'. 103 (6). | |
| 2006 | O’Connor, R and Hughes, G and Glans, P-A and Learmonth, T and Smith, KE (2006) 'X-ray photoemission and X-ray absorption studies of Hf-silicate dielectric layers'. 253 (5):2770-2775. | |
| 2006 | O'Connor, R.; McDonnell, S.; Hughes, G.; Smith, K.E. (2006) 'Photoemission studies of pulsed-RF plasma nitrided ultra-thin SiON dielectric layers'. Surface Science, . [Link] [DOI] | |
| 2006 | O'Connor, R.; Hughes, G.; Glans, P.-A.; Learmonth, T.; Smith, K.E. (2006) 'X-ray photoemission and X-ray absorption studies of Hf-silicate dielectric layers'. Applied Surface Science, . [Link] [DOI] | |
| 2006 | O’Connor, R and McDonnell, S and Hughes, G and Smith, KE (2006) 'Photoemission studies of pulsed-RF plasma nitrided ultra-thin SiON dielectric layers'. 600 (3):532-536. | |
| 2005 | O’Connor, Robert and Hughes, Greg and Degraeve, Robin and Kaczer, Ben (2005) 'Charge trapping in MOSFETs with HfSiON dielectrics during electrical stressing'. 77 (3-4):302-309. | |
| 2005 | O'Connor, R.; Hughes, G.; Degraeve, R.; Kaczer, B. (2005) 'Charge trapping in MOSFETs with HfSiON dielectrics during electrical stressing'. Microelectronic Engineering, . [Link] [DOI] | |
| 2005 | O'Connor, R.; Hughes, G.; Degraeve, R.; Kaczer, B.; Kauerauf, T. (2005) 'Reliability of HfSiON gate dielectrics'. Semiconductor Science and Technology, . [Link] [DOI] | |
| 2005 | O’Connor, Robert and Hughes, Greg and Degraeve, Robin and Kaczer, Ben (2005) 'Progressive breakdown in ultrathin SiON dielectrics and its effect on transistor performance'. 45 (5-6):869-874. | |
| 2005 | O'Connor, Robert and McDonnell, Stephen and Hughes, Greg and Degraeve, Robin and Kauerauf, Thomas (2005) 'Low voltage stress-induced leakage current in 1.4--2.1 nm SiON and HfSiON gate dielectric layers'. 20 (8). | |
| 2005 | O'Connor, R.; McDonnell, S.; Hughes, G.; Degraeve, R.; Kauerauf, T. (2005) 'Low voltage stress-induced leakage current in 1.4-2.1 nm SiON and HfSiON gate dielectric layers'. Semiconductor Science and Technology, . [Link] [DOI] | |
| 2004 | O'Connor, Robert and Degraeve, Robin and Kaczer, Ben and Veloso, Anabela and Hughes, Greg and Groeseneken, Guido (2004) 'Weibull slope and voltage acceleration of ultra-thin (1.1--1.45 nm EOT) oxynitrides'. 72 (1-4):61-65. | |
| 2004 | O'Connor, Robert and Hughes, Greg and Degraeve, Robin and Kaczer, Ben (2004) 'Temperature-accelerated breakdown in ultra-thin SiON dielectrics'. 19 (11). | |
| 2004 | O'Connor, R.; Hughes, G.; Degraeve, R.; Kaczer, B. (2004) 'Temperature-accelerated breakdown in ultra-thin SiON dielectrics'. Semiconductor Science and Technology, . [Link] [DOI] | |
| 2004 | O'Connor, Robert and Hughes, Greg and Degraeve, Robin and Kaczer, Ben and Kauerauf, Thomas (2004) 'Reliability of HfSiON gate dielectrics'. 20 (1). |
Certain data included herein are derived from the © Web of Science (2025) of Clarivate. All rights reserved.
Research Interests
Robert’s research interests lie in interface chemistry and thin film characterisation. Understanding the interfaces between materials is key in thin film technologies that underpin semiconductor based manufacturing and energy harvesting technologies. His lab uses x-ray photoelectron spectroscopy in conjunction with thin film deposition techniques in order to characterise surface reactions between a wide range or metals, oxides, semiconductor, and organic materials. The group also makes regular trips to European synchrotron facilities. He currently supervises 5 postgraduate students across a range of projects including photo-electrochemical water splitting and area-selective deposition. He is also the designated tool owner for a new state-of-the-art integrated atomic later deposition – x-ray photoelectron spectroscopy tool which DCU has recently acquired.