Integrated ALD-XPS Cluster


Oxford Instruments & Scienta Omicron  ALD/XPS

The ALD/XPS facility in the NRF enables the development of advanced manufacturing processes which involve controlling material properties at the nanoscale. This convergence of basic scientific knowledge with advanced manufacturing technology can directly lead to the development of innovative  products in a rapidly growing industrial sector of the Irish economy.

 The system facilitates:

  • Rapid sample transfer time between Atomic Layer Deposition (ALD) processing module and the X-Ray Photoelectron Spectroscopy (XPS) system. This all occurs under ultra low vacuum which eliminates atmospheric effects such as oxidation.

  • Enables in-situ surface plasma treatments of surfaces

  • Optimization of Atomic Layer Deposition (ALD) processes including investigations of infiltration of ALD precursors into polymer materials

  • Plasma assisted oxidation/reduction studies of infiltrated polymer materials

  • Monochromated XPS based chemical characterisation of individual processing steps.

  • XPS 2-D mapping of surface chemical composition at a spatial resolution of 10µm

On Request